Two photochemical routes have been considered for the surface topologically
defined functionalization of poly(ether ether ketone) (PEEK) films, based,
respectively, on the covalent coupling of molecules protected with a photo
clivable group (indirect way A), and on the photografting of various azide
derivatives (direct way B). (4,5-Dimethoxy-2-nitrophenyl)methyl succinamate
3 could be coupled to the PEEK-OH film surface, under wet-chemistry condit
ions, but in rather low yield. 4-Azido-benzoic acid 9,4-azido-tetrafluorobe
nzoic acid 6 and N-butyl-N'-(4-azidophenyl)thiourea 8 were grafted on the P
EEK and PEEK-OH films surface, under mild photochemical conditions, in mode
rate to good yields. Attempts to obtain patterned surfaces with 4-azido-ben
zoic acid 9 and sodium 5-azido-naphthalene-1-sulphonate 10, under microlith
ographic conditions, failed. (C) 2000 Elsevier Science Ltd. All rights rese
rved.