X-ray induced modification of electronic properties of boron nitride thin films

Citation
V. Ageev et al., X-ray induced modification of electronic properties of boron nitride thin films, J APPL PHYS, 88(12), 2000, pp. 7197-7200
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
88
Issue
12
Year of publication
2000
Pages
7197 - 7200
Database
ISI
SICI code
0021-8979(200012)88:12<7197:XIMOEP>2.0.ZU;2-S
Abstract
X-ray induced modification of the electronic properties of nanocrystalline boron nitride (BN) films with different compositions and carbon impurity co ntents is reported. The related changes of the surface composition and vale nce band structures of the irradiated films are discussed. X-ray irradiatio n of nanocrystalline BN films is shown to widen areas with intermediate val ues of electroconductivity (associated with areas of high emission density) and to increase the average value of electroconductivity by redistributing surface potentials and electron emission sites. Improvement of the field e mission is observed with both increasing electron current and diminishing t hresholds. Longer x-ray irradiation times yield greater improvement. (C) 20 00 American Institute of Physics. [S0021- 8979(00)03621-5].