Mv. Malyshev et Vm. Donnelly, Diagnostics of inductively coupled chlorine plasmas: Measurement of Cl-2 and Cl number densities, J APPL PHYS, 88(11), 2000, pp. 6207-6215
This article presents measurements of absolute Cl-2 and CI number densities
in a chlorine transformer-coupled plasma. It is part of a series of report
s on measurements of densities and energy distributions of all charged and
neutral species in the same plasma system over an extensive range of pressu
re and power. Cl-2 and Cl number densities were determined from optical emi
ssion spectroscopy and advanced actinometry. Number densities relative to t
he Xe actinometry gas are reported as a function of pressure (1-20 mTorr) a
nd power (10-1000 W) during slow etching of SiO2-covered Si wafers. A detai
led treatment of the effects of gas temperature on the conversion of these
ratios into absolute number densities is also included. Cl-2 is largely (si
milar to 90%) dissociated at the highest powers, with a somewhat higher deg
ree of dissociation at low pressure. The Cl number density becomes nearly i
ndependent of power at high powers (I:specially at lower pressure) due to t
he combination of a higher degree of dissociation of Cl-2 and an overall dr
op in number density due to heating of the gas. A zero-dimensional (global)
model is used to compute Cl-2 and Cl number densities. It gives a Cl wall
recombination coefficient of 0.04 on the plasma-seasoned stainless steel wa
lls. (C) 2000 American Institute of Physics. [S0021-8979(00)07523-X].