X-ray absorption and infrared reflectance of poled silica glass for secondharmonic generation

Citation
V. Nazabal et al., X-ray absorption and infrared reflectance of poled silica glass for secondharmonic generation, J APPL PHYS, 88(11), 2000, pp. 6245-6251
Citations number
31
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
88
Issue
11
Year of publication
2000
Pages
6245 - 6251
Database
ISI
SICI code
0021-8979(200012)88:11<6245:XAAIRO>2.0.ZU;2-K
Abstract
Structural alterations induced by a thermal poling treatment which is at th e origin of second harmonic generation in a Herasil silica glass are studie d by x-ray absorption near-edge spectroscopy (XANES). Multiple scattering c alculations are performed to explain the experimental O-K edge XANES shape of unpoled surfaces of the glass and then to interpret modifications result ing from poling. The observations are consistent with emergence of disorder by breaking Si-O bridging bonds which are not completely removed by a ther mal depoling treatment. Fourier transform infrared spectroscopy shows modif ications of nonbridging oxygen bonds which are coherent with a model involv ing a protons migration during poling. Moreover, a partial anisotropy in th e direction of the electrostatic field which is applied during the poling t reatment is observed. (C) 2000 American Institute of Physics. [S0021-8979(0 0)08423-1].