Vn. Dobrovolsky et al., High-amplitude high-frequency oscillations of temperature, electron-hole pair concentration, and current in silicon-on-insulator structures, J APPL PHYS, 88(11), 2000, pp. 6554-6559
Interacting oscillations of the current, lattice temperature, and concentra
tion of thermally generated electron-hole pairs were discovered in silicon
films of silicon-on-insulator structures upon their heating with extremely
high current. The nature of the oscillations discovered is fundamentally di
fferent from what has yet been known. They occur owing to two competing pro
cesses: the thermal generation of electron-hole pairs, and the pair concent
ration reduction caused by the current flowing through the silicon film wit
h nonuniform temperature field. In our experiments the current density reac
hed 1.5x10(5) A/cm(2) and the specific power dissipated in the silicon film
exceeded 3.6 GW/cm(3). We observed the oscillation frequencies up to 3 MHz
and variations of the current and pair concentration were more than tenfol
d, while the temperature varied from 700-740 to 950-1300 K. (C) 2000 Americ
an Institute of Physics. [S0021-8979(00)01424-9].