G. Ghosh, Coarsening kinetics of Ni3Sn4 scallops during interfacial reaction betweenliquid eutectic solders and Cu/Ni/Pd metallization, J APPL PHYS, 88(11), 2000, pp. 6887-6896
The thickening and radial growth kinetics of Ni3Sn4 scallops formed during
interfacial reaction between liquid eutectic solders and electroplated Ni/P
d metallization scheme on Cu substrate is studied. Selective etching of sol
der revealed three-dimensional morphology, and the dynamical phenomena,such
as faceting, competitive growth, and coalescence of Ni3Sn4 scallops during
interfacial reaction. The growth kinetics of the N3Sn4 scallops in the sub
micron length scale was analyzed using an Arrhenius-type of equation. Both
kinetics exhibited nonparabolic behavior with the time exponent greater tha
n three. The thickening of the Ni3Sn4 layer during interfacial reaction was
accompanied by the concomitant coarsening of the scallops. The coarsening
kinetics during early stages of interfacial reaction was characterized by (
i) a temporal law with the time exponent greater than three, (ii) a decreas
e in the average number of scallops per unit volume with reaction time, and
(iii) an increase in the standard deviation of the normalized size distrib
ution with reaction time. The temporal laws for growth kinetics are discuss
ed in terms of the effects of characteristic microstructural length scale a
nd the existing coarsening theories. Among the coarsening theories, both th
e temporal law and the characteristics of radial size distributions were fo
und to be consistent with the predictions of a recent Monte Carlo simulatio
n of liquid-phase sintering in a two-phase system where the volume fraction
of the second phase was very high. (C) 2000 American Institute of Physics.
[S0021-8979(00)08923-4].