M. Joyeux et al., Vibrational dynamics up to the dissociation threshold: A case study of two-dimensional HOCl, J CHEM PHYS, 113(21), 2000, pp. 9610-9621
This work is aimed at extending recent studies dealing with the highly exci
ted vibrational dynamics of HOCl [J. Chem. Phys. 111, 6807 (1999); J. Chem.
Phys. 112, 77 (2000)], by taking advantage of the fact that the OH-stretch
remains largely decoupled from the two other degrees of freedom up to and
above the dissociation threshold. The molecule is thus reduced to a two-dim
ensional (2D) system by freezing the OH bond length to its equilibrium valu
e. All of the calculated bound states of the 2D system, as well as the firs
t 40 resonances, can be assigned with a Fermi polyad quantum number. The bi
furcation diagram of the principal families of periodic orbits (POs) is ext
ended to higher energies compared to 3D studies. In particular, the birth o
f "inversion" states (states exploring two equivalent wells connected throu
gh the linear HOCl configuration) is related to a period-doubling bifurcati
on of the families of bending POs, while ''dissociation'' states (states fo
r which the energy flows back and forth along the dissociation pathway) are
shown to lie on top of three successive families of POs born at saddle-nod
e bifurcations. Based on the derivation of a classical analogue of the quan
tum Fermi polyad number, the energies of particular quantum states and clas
sical POs are plotted on the same diagram for the 2D ab initio surface and
are shown to agree perfectly. In contrast, comparison of classical Poincare
surfaces of section and quantum Husimi distributions suggests that the cla
ssical dynamics of 2D HOCl is much more chaotic than the quantum dynamics.
This observation is discussed in terms of the quantum/classical corresponde
nce, and particularly of the vague tori introduced by Reinhardt. It is neve
rtheless shown that quantum and classical mechanics agree in predicting a s
low intramolecular vibrational energy redistribution (IVR) between the OCl
stretch and the bend degrees of freedom. (C) 2000 American institute of Phy
sics. [S0021-9606(00)90945-4].