In this investigation, the adhesion between particles and plates with root-
mean-square, rms, surface roughness of 0.17-10.5 nm was measured by atomic
force microscopy. Measurements obtained with particles both larger and smal
ler than the surface asperities are presented. Results indicate adhesion fo
rce decreases sharply with increasing surface roughness in the nanometer sc
ale (<2 nm), followed by a gradual and slow decrease with further increase
in roughness. Existing models were found to significantly underestimate adh
esion force. Hence, a new model based on a geometry that considers both the
height and breadth of asperities yielding an increased asperity radius com
pared to previous approaches, as detailed in Part I of this series, is appl
ied using both van der Waals and elastic deformation/work of adhesion based
approaches. For the system studied in this investigation, the adhesion for
ces predicted by the proposed model are considerably more accurate than tho
se predicted by past models. (C) 2000 Academic Press.