Fabrication of high-frequency electron beam moire grating using multi-deposited layer techniques

This paper proposed new ways fur producing multi-layer model grids For elec tron beam moire method. An electron beam lithography system was set up unde r scanning electron microscope which was equipped with a beam blanking; dev ice and a pattern generator. The two-deposited-metal layers method was used to manufacture electron beam grating for high-temperature use. The results verify that the Zr-Pt-type grating possesses heat resistance up to 1100 de greesC in vacuum. A new type of composite grating with frequencies 100 line s/mm and 1000 lines/mm using three deposited layers was produced. A 10 000 lines/mm two-deposited-metal layers grating was successfully fabricated usi ng electron beam lithography. (C) 2000 Elsevier Science Ltd. All rights res erved.