Reduction of the source size of gas-puff z-pinch plasmas using an inductive pulsed power system

Citation
K. Imasaka et al., Reduction of the source size of gas-puff z-pinch plasmas using an inductive pulsed power system, REV SCI INS, 71(12), 2000, pp. 4438-4444
Citations number
22
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences","Instrumentation & Measurement
Journal title
REVIEW OF SCIENTIFIC INSTRUMENTS
ISSN journal
00346748 → ACNP
Volume
71
Issue
12
Year of publication
2000
Pages
4438 - 4444
Database
ISI
SICI code
0034-6748(200012)71:12<4438:ROTSSO>2.0.ZU;2-R
Abstract
A small scale inductive pulsed power (IPP) generator with copper wire fuses as an opening switch has been applied to an argon gas-puff z-pinch plasma which can be used as a point source for x-ray lithography. The IPP generato r with fuses supplies a driving current of 60 kA in 400 ns to the z-pinch p lasma. Without fuses, the generator serves as a conventional fast bank (FB) system which supplies z-pinch current of 60 kA in 4.5 mus. Characteristics of the z-pinch implosions in IPP and FB systems are investigated and compa red. The result obtained shows that the intensity of soft x rays emitted fr om hot spots in both systems is decreased gradually with longer delay time, which is the time difference between energizing a gas-puff actuator and a primary current trigger. Dual axis pinhole imagery shows that the hot spot size is 0.8 mm in diameter in both systems. However, the average radial dis placement of hot spots is 0.9 mm in the FB system and it is reduced to 0.4 mm in the IPP system. Optical framing camera images have confirmed that the radial distribution of hot spots is due to kink instability. The framing i mages also show that the imploding plasma in the FB system which has a pinc h size of 2.2 mm in diameter can be further compressed to 1.3 mm. The IPP s ystem can suppress the kink instability of pinch plasma and increases plasm a column uniformity along the z axis. This suggests that the IPP system can improve the stability of the pinched plasma so as to minimize the end-on s ource size for x-ray lithography applications. (C) 2000 American Institute of Physics. [S0034-6748(00)02612-5].