Microstereolithography of lead zirconate titanate thick film on silicon substrate

Citation
Xn. Jiang et al., Microstereolithography of lead zirconate titanate thick film on silicon substrate, SENS ACTU-A, 87(1-2), 2000, pp. 72-77
Citations number
24
Categorie Soggetti
Instrumentation & Measurement
Journal title
SENSORS AND ACTUATORS A-PHYSICAL
ISSN journal
09244247 → ACNP
Volume
87
Issue
1-2
Year of publication
2000
Pages
72 - 77
Database
ISI
SICI code
0924-4247(200012)87:1-2<72:MOLZTT>2.0.ZU;2-9
Abstract
The microstereolithography (mu SL) of lead zirconate titanate (PZT) thick f ilms on platinum-buffered silicon substrates is reported for the first time in this paper. Crack-free PZT thick films (80-130 mum thick) have been fab ricated by laser direct-write UV polymerization from the HDDA-based UV cura ble PZT suspensions. The characterization of the fired films shows dielectr ic permittivities of 120-200, tangent loss of 0.92-2.5% and remnant polariz ation of 0.9-1.7 muC/cm(2). The field-induced longitudinal piezoelectric co efficient (d(33)) of an 84-mum thick film is 100 pC/N and the piezoelectric voltage coefficient (g(33)) is about 59.5 x 10(-3) V m/N. These results de monstrated the potential for mu SL of advanced piezoelectric microsensors a nd microactuators. (C) 2000 Elsevier Science B.V. All rights reserved.