Reducing PFC gas emissions from CVD chamber cleaning

Authors
Johnson, AD Entley, WR Maroulis, PJ
Citation
Ad. Johnson et al., Reducing PFC gas emissions from CVD chamber cleaning, SOL ST TECH, 43(12), 2000, pp. 103
Citations number
18
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
SOLID STATE TECHNOLOGY
ISSN journal
0038111X → ACNP
Volume
43
Issue
12
Year of publication
2000
Database
ISI
SICI code
0038-111X(200012)43:12<103:RPGEFC>2.0.ZU;2-X
Abstract
Reduction of perfluorocompound emissions is a committed goal of the semicon ductor industry. The majority of PFC usage is for CVD chambers. Three strat egies for reducing the emissions are presented here: 1) optimization of tra ditional C-2,F-6-based in situ cleans, 2) substitution of NF3 for C2F6 in i n situ cleans, and 3) remote NF, cleaning. The improvements are demonstrate d on equipment from major manofacturers of CVD tools.