An empirical model for leakage current in poly-silicon thin film transistor

Citation
Mj. Siddiqui et S. Qureshi, An empirical model for leakage current in poly-silicon thin film transistor, SOL ST ELEC, 44(11), 2000, pp. 2015-2019
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Eletrical & Eletronics Engineeing
Journal title
SOLID-STATE ELECTRONICS
ISSN journal
00381101 → ACNP
Volume
44
Issue
11
Year of publication
2000
Pages
2015 - 2019
Database
ISI
SICI code
0038-1101(200011)44:11<2015:AEMFLC>2.0.ZU;2-0
Abstract
The electric fields present in drain depletion region of poly-silicon thin film transistors (poly-Si TFTs) result in the enhancement of emission rate from the traps. An empirical relation between the field enhanced emission r ate and electric field is proposed, which can be used to model the leakage current of poly-Si TFTs as a function of gate bias and temperature. The lea kage current shows good agreement with the experimental data over wide rang e of temperature and gate bias. The model can be useful for circuit simulat ion. (C) 2000 Elsevier Science Ltd. All rights reserved.