Two-dimensional simulation of an electron cyclotron resonance plasma source with self-consistent power deposition

Citation
Mh. Liu et al., Two-dimensional simulation of an electron cyclotron resonance plasma source with self-consistent power deposition, SURF COAT, 131(1-3), 2000, pp. 29-33
Citations number
19
Categorie Soggetti
Material Science & Engineering
Journal title
SURFACE & COATINGS TECHNOLOGY
ISSN journal
02578972 → ACNP
Volume
131
Issue
1-3
Year of publication
2000
Pages
29 - 33
Database
ISI
SICI code
0257-8972(20000901)131:1-3<29:TSOAEC>2.0.ZU;2-M
Abstract
Using a refined two-dimensional hybrid-model with self-consistent microwave absorption, we have investigated the change of plasma parameters such as p lasma density and ionization rate with the operating conditions. The depend ence of the ion current density and ion energy and angle distribution funct ion at the substrate surface vs. the radial position, pressure and microwav e power were discussed. Results of our simulation can be compared qualitati vely with many experimental measurements. (C) 2000 Published by Elsevier Sc ience B.V. All rights reserved.