TiCN layers were deposited on an aluminum alloy (Si 0.5%, Fe 0.5%, Cu 4.3%,
Mn 0.6%, Mg 1.5%, Cr 0.1%, Zn 0.25%, bal. Al) by using diethylaminotitaniu
m, hydrogen and nitrogen with the pulsed d.c. PACVD process. The effect of
process parameters such as precursor evaporation temperature, duty ratio, f
requency, voltage, H-2/N-2 gas ratio on the properties of the TiCN layer wa
s investigated. The layer thus obtained had high hardness and a low frictio
n coefficient. Detailed results on the hardness, surface morphology, WDS an
alysis, wear test and scratch test of these layers are presented. (C) 2000
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