Investigation on processing of industrial set-up plasma enhanced chemical vapor deposition with pulsed d.c. power

Authors
Citation
Sl. Ma et al., Investigation on processing of industrial set-up plasma enhanced chemical vapor deposition with pulsed d.c. power, SURF COAT, 131(1-3), 2000, pp. 131-135
Citations number
17
Categorie Soggetti
Material Science & Engineering
Journal title
SURFACE & COATINGS TECHNOLOGY
ISSN journal
02578972 → ACNP
Volume
131
Issue
1-3
Year of publication
2000
Pages
131 - 135
Database
ISI
SICI code
0257-8972(20000901)131:1-3<131:IOPOIS>2.0.ZU;2-0
Abstract
The possibility of surface modification on dyes and tools is investigated w ith pulsed d.c. plasma enhanced chemical Vapor deposition (PECVD) on an ind ustrial scale. The effects of pulsed parameters such as pulsed voltage and pulsed frequency on the performance of the coated samples are analyzed base d on mechanical testing and microstructural examinations. The tested sample s are titanium nitride film coated on steels and cemented carbides. Experim ents indicate that the inner-wall of the holes can be coated with the aid o f pulsed d.c. plasma, and the quality of coatings depends to a great extent on the pulsed parameters. The adhesion strength characterized by the criti cal force in indentation test can be increased over 1000 N on the high-spee d steel substrate when the processing condition is optimized, and the proce ssing procedure plays an important role in the pulsing deposition. (C) 2000 Elsevier Science B.V. All rights reserved.