Dynamics of optical nonlinearity of Ge nanocrystals in a silica matrix

Citation
Yx. Jie et al., Dynamics of optical nonlinearity of Ge nanocrystals in a silica matrix, APPL PHYS L, 77(24), 2000, pp. 3926-3928
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
77
Issue
24
Year of publication
2000
Pages
3926 - 3928
Database
ISI
SICI code
0003-6951(200012)77:24<3926:DOONOG>2.0.ZU;2-D
Abstract
The optical nonlinearity and excited carrier lifetime in Ge nanocrystals (n c-Ge) embedded in a silica matrix have been investigated by means of single beam z scan and pump-probe techniques with laser pulse duration of 35 ps a nd 532 nm wavelength. The nc-Ge samples were prepared using magnetron cospu ttering and postgrowth annealing at 800 degreesC. The nonlinear absorption coefficient alpha (2) and refractive index n(2) were found to range between 190 and 760 cm/GW, and 0.0026 and 0.0082 cm(2)/GW, respectively, and be pr oportional to the Ge concentration in the film. The confined excited carrie rs were found to depopulate with a lifetime of similar to 70 ps. The nonlin earity in Ge nanocrystals is deduced to originate mainly from excited carri er absorption, with two-photon absorption providing a small contribution. ( C) 2000 American Institute of Physics. [S0003-6951(00)05249-9].