Dual-gate AlGaN/GaN modulation-doped field-effect transistors with cut-offfrequencies f(T) > 60 GHz

Citation
Ch. Chen et al., Dual-gate AlGaN/GaN modulation-doped field-effect transistors with cut-offfrequencies f(T) > 60 GHz, IEEE ELEC D, 21(12), 2000, pp. 549-551
Citations number
10
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE ELECTRON DEVICE LETTERS
ISSN journal
07413106 → ACNP
Volume
21
Issue
12
Year of publication
2000
Pages
549 - 551
Database
ISI
SICI code
0741-3106(200012)21:12<549:DAMFTW>2.0.ZU;2-Z
Abstract
We demonstrate dual-gate AlGaN/GaN modulation-doped field-effect transistor s (MODFETs) with gate-lengths of 0.16 mum and 0.35 mum for the first and se cond gates, respectively. The dual-gate device exhibits a current-gain cut- off frequency f(T) > 60 GHz, and can simultaneously achieve a high breakdow n voltage of >+100 V. In comparison to single-gate devices with the same ga te length 0.16 mum, dual-gate FETs can significantly increase breakdown vol tages, largely increasing the maximum allowable drain bias for high power a pplication. The continuous wave (CW) output power is in excess of 3.5 W/mm at 8.2 GHz, The corresponding large-signal gain is 12 dB and the power adde d efficiency is 45%, The dual-gate device with different gate lengths shows the capability of providing simultaneous high cut-off frequencies, and hig h breakdown voltages for broadband power amplifiers.