SIMS measurements of oxygen impurities in AlGaInP semiconductor material and laser diodes

Citation
Sp. Najda et al., SIMS measurements of oxygen impurities in AlGaInP semiconductor material and laser diodes, J CRYST GR, 220(3), 2000, pp. 226-230
Citations number
10
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
220
Issue
3
Year of publication
2000
Pages
226 - 230
Database
ISI
SICI code
0022-0248(200012)220:3<226:SMOOII>2.0.ZU;2-N
Abstract
(AlyGa1-y)(0.52)In-0.48 P (y = 0.0, 0.2 and 0.7) was grown by MBE using eit her GaP or phosphine as the phosphorus source material. SIMS measurements r eveal that phosphide semiconductor material grown by using GaP contains sig nificantly more oxygen impurities compared to gas source material. A SIMS m easurement of a phosphide laser grown by gas source MBE shows low oxygen co ntamination in the quaternary regions of the device, but interestingly, a s ignificant oxygen spike occurs in the active region. (C) 2000 Elsevier Scie nce B.V. All rights reserved.