High preferred (002) orientation Al-doped ZnO (ZAO) films were prepared by
DC magnetron reactive sputtering from a Zn target mixed with Al of 2.0wt%.
The dependence of spatial distributions of resistivity on substrate tempera
ture indicates that the spatial distribution of resistivity across substrat
e placed parallel to the target was improved by increasing substrate temper
ature. XPS analysis indicates Al-enrichment on the film surface. (C) 2000 E
lsevier Science B.V. All rights reserved.