High-rate deposition of LiNb1-xTaxO3 films by thermal plasma spray CVD

LiNb1-xTaxO3 films were prepared by a thermal plasma spray CVD method using liquid source materials. Preferentially (0 0 I)-oriented LiNb1-xTaxO3 film s with satisfactory in-plane and out-of-plane alignment were fabricated on sapphire (0 0 1) substrates. The full-width at half-maximum (FWHM) of the ( 0 0 6) rocking curve could achieve 0.12 degrees, which was comparable with those of LiNbO3 and LiTaO3 films prepared by other conventional vapor-phase deposition methods. The deposition rate was up to 0.07 mum/min, which was 5-40 times faster than those for most other conventional vapor-phase deposi tion methods. From inductively coupled plasma atomic emission spectroscopy analysis, x values of these films were estimated to be 0.36-0.49. (C) 2000 Elsevier Science B.V. All rights reserved.