Organic imaging materials: a view of the future

Over the last half century, the world semiconductor industry has provided p henomenal increases in computing power while simultaneously lowering produc tion costs. This achievement is largely the result of the industry being ab le to print smaller and smaller features using photolithographic techniques . The organic imaging materials used in the photolithography (generally kno wn as photoresists) have undergone many changes over the industry's history , and if the increases in computing speeds and decreases in costs are to co ntinue in the future, more changes are necessary. This paper discusses the current generation of photoresists and the on going development of future g eneration photoresist technologies. Copyright (C) 2000 John Wiley & Sons, L td.