Using 12 MeV electron beams to develop silicon P+NN+ high frequency rectifying diodes

Citation
Ds. Hang et al., Using 12 MeV electron beams to develop silicon P+NN+ high frequency rectifying diodes, NUCL INST B, 171(4), 2000, pp. 470-474
Citations number
5
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences","Instrumentation & Measurement
Journal title
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
ISSN journal
0168583X → ACNP
Volume
171
Issue
4
Year of publication
2000
Pages
470 - 474
Database
ISI
SICI code
0168-583X(200012)171:4<470:U1MEBT>2.0.ZU;2-L
Abstract
Twelve MeV electron beams were used to irradiate common P+NN+ diodes (1 A a nd 1 kV) in order to transfer them into high frequency rectifying ones. Som e interesting results have been obtained. It seems that this method is supe rior to the traditional gold-doping technique in controlling precisely the lives of the minority carriers. Compared with the later electron beam irrad iation made the reverse recovery time (t(rr)) and FWD-voltage (V-F) Of the diodes better consistent and repeatable. The high temperature performance w as also obviously improved. The qualified rate of diodes was enhanced by mo re than 30%. (C) 2000 Elsevier Science B.V. All rights reserved.