PLASMA-ETCHED NEURAL PROBES

A new method is presented for microfabricating silicon-based neural pr obes that are designed for neurobiology research. Such probes provide unique capabilities to record high-resolution signals simultaneously f rom multiple, precisely defined locations within neural tissue, The fa brication process utilizes a plasma etch to define the probe outline, resulting in sharp tips and compatibility with standard CMOS processes , A low-noise amplifier array has been fabricated through the MOSIS se rvice to complete a system that has been used in multiple successful p hysiological experiments.