The oxidation kinetics of TiAl alloys with and without 3 and 5 wt.% additio
ns of Si3N4 particles were studied at 1173 and 1273 K in 1 atm of air. The
Si3N4 dispersions were unstable in the matrix phase, so that some of them r
eacted with titanium during sintering to form Ti5Si3 and dissolved nitrogen
. The oxide scale formed on TiAl-Si3N4 alloys consisted of an outer TiO2, a
n intermediate (Al2O3+TiO2), and an inner (TiO2+Al2O3) mixed layers. The en
hanced alumina-forming tendency, the presence of discrete SiO2 particles be
low the outer TiO2 layer, and the improved scale adhesion by Si3N4 dispersi
ons were attributable mainly to the increased oxidation resistance compared
to the Si3N4-free TiAl alloys. Marker experiments showed that, for TiAl-Si
3N4 alloys, the primary mode of scale growth was the outward diffusion of t
itanium ions for the outer scale and the inward transport of oxygen ions fo
r the inner scale.