The effect of Si3N4 additions on the oxidation resistance of TiAl alloys

Citation
Db. Lee et al., The effect of Si3N4 additions on the oxidation resistance of TiAl alloys, OXID METAL, 54(5-6), 2000, pp. 575-589
Citations number
31
Categorie Soggetti
Metallurgy
Journal title
OXIDATION OF METALS
ISSN journal
0030770X → ACNP
Volume
54
Issue
5-6
Year of publication
2000
Pages
575 - 589
Database
ISI
SICI code
0030-770X(200012)54:5-6<575:TEOSAO>2.0.ZU;2-6
Abstract
The oxidation kinetics of TiAl alloys with and without 3 and 5 wt.% additio ns of Si3N4 particles were studied at 1173 and 1273 K in 1 atm of air. The Si3N4 dispersions were unstable in the matrix phase, so that some of them r eacted with titanium during sintering to form Ti5Si3 and dissolved nitrogen . The oxide scale formed on TiAl-Si3N4 alloys consisted of an outer TiO2, a n intermediate (Al2O3+TiO2), and an inner (TiO2+Al2O3) mixed layers. The en hanced alumina-forming tendency, the presence of discrete SiO2 particles be low the outer TiO2 layer, and the improved scale adhesion by Si3N4 dispersi ons were attributable mainly to the increased oxidation resistance compared to the Si3N4-free TiAl alloys. Marker experiments showed that, for TiAl-Si 3N4 alloys, the primary mode of scale growth was the outward diffusion of t itanium ions for the outer scale and the inward transport of oxygen ions fo r the inner scale.