Thermal route for chemical modification and photoluminescence stabilization of porous silicon

Citation
R. Boukherroub et al., Thermal route for chemical modification and photoluminescence stabilization of porous silicon, PHYS ST S-A, 182(1), 2000, pp. 117-121
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH
ISSN journal
00318965 → ACNP
Volume
182
Issue
1
Year of publication
2000
Pages
117 - 121
Database
ISI
SICI code
0031-8965(200011)182:1<117:TRFCMA>2.0.ZU;2-Z
Abstract
This paper. describes photoluminescence (PL) stabilization through chemical modification of freshly prepared porous silicon (PSi) surfaces. As-anodize d PSi surfaces react with l-alkenes, non-conjugated dienes and aldehydes at elevated temperatures to form organic monolayers covalently bonded to the surface. This thermal route is very general and tolerant of different funct ional groups. We have characterized these organic monolayers using diffuse reflectance infrared Fourier-transform (DRIFT), Auger and Raman spectroscop ies. The PL intensity and peal; energy of the as-anodized PSi is not affect ed by the chemical functionalization. Aging these derivatized PSi samples i n ambient air has I-io effect on the FL. In fact, it is completely preserve d even when they are steam treated for six weeks at 70 degreesC and 100% hu midity. This treatment completely destroys the structural integrity of H-te rminated PSi.