R. Boukherroub et al., Thermal route for chemical modification and photoluminescence stabilization of porous silicon, PHYS ST S-A, 182(1), 2000, pp. 117-121
This paper. describes photoluminescence (PL) stabilization through chemical
modification of freshly prepared porous silicon (PSi) surfaces. As-anodize
d PSi surfaces react with l-alkenes, non-conjugated dienes and aldehydes at
elevated temperatures to form organic monolayers covalently bonded to the
surface. This thermal route is very general and tolerant of different funct
ional groups. We have characterized these organic monolayers using diffuse
reflectance infrared Fourier-transform (DRIFT), Auger and Raman spectroscop
ies. The PL intensity and peal; energy of the as-anodized PSi is not affect
ed by the chemical functionalization. Aging these derivatized PSi samples i
n ambient air has I-io effect on the FL. In fact, it is completely preserve
d even when they are steam treated for six weeks at 70 degreesC and 100% hu
midity. This treatment completely destroys the structural integrity of H-te
rminated PSi.