Thermally-carbonized porous silicon films have been prepared by exploiting
the dissociation of acetylene. Thermoanalytical methods have been used to s
tudy the oxidation behavior of these films in different oxidizing ambients,
The results have been compared to other stabilization methods. Due to enha
nced adsorption and only slightly reduced specific surface area, the carbon
ization of porous silicon was found to be an attractive treatment for sensi
ng applications. The possible pnsttreatments are also discussed.