In order to explain experimental results for photoluminescence (PL) from po
rous silicon (PS), a novel multiple mechanism model is suggested. There are
three types of competitive photoexcitation-photoemission processes in PS;
and which of them dominates, is usually determined by the oxidation degree
of the PS. For a PS sample free from oxidation, the process that both photo
excitation and photoemission of electron-hole pails occur within nanometer
silicon particles (NSPs) is dominating. For most oxidized PS samples, the p
rocess with the photoexcitation occuring in NSPs, but photoemission occurin
g in luminescence centers in the SiOx layers surrounding the NSPs, dominate
s. When NSPs in oxidized PS samples have very small density or very small o
r large sizes, the process that both photoexcitation and photoemission occu
r in Si oxide layers is dominating.