In this work we studied the compatibility of amorphous thin film technology
with the porous silicon in case of large area applications like gas sensor
s. We found that thin amorphous silicon layer growth on porous silicon subs
trates preserves the room temperature photoluminescence of porous material.
Also amorphous-porous silicon heterojunction shows a good rectifying behav
iour. Those properties, correlated with the porous silicon sensitivity to t
he gas environments, can be effectively used to realise heterojunction diod
es whose current voltage characteristics are modified by the gas reactivity
on the porous surface. Sensitivity of those devices and response time to d
ifferent gas exposure have been investigated.