Radical-based reduction of phosphine sulfides and phosphine selenides by (Me3Si)(3)SiH

Authors
Romeo, R Wozniak, LA Chatgilialoglu, C
Citation
R. Romeo et al., Radical-based reduction of phosphine sulfides and phosphine selenides by (Me3Si)(3)SiH, TETRAHEDR L, 41(50), 2000, pp. 9899-9902
Citations number
19
Categorie Soggetti
Chemistry & Analysis","Organic Chemistry/Polymer Science
Journal title
TETRAHEDRON LETTERS
ISSN journal
00404039 → ACNP
Volume
41
Issue
50
Year of publication
2000
Pages
9899 - 9902
Database
ISI
SICI code
0040-4039(200012)41:50<9899:RROPSA>2.0.ZU;2-#
Abstract
Tris(trimethylsilyl)silane reacts with phosphine sulfides and phosphine sel enides under free radical conditions to give the corresponding phosphines i n good yields. Stereochemical studies on P-chiral phosphine sulfides show t hese reductions proceed with retention of configuration. (C) 2000 Elsevier Science Ltd. All rights reserved.