F. Bensliman et al., Electrochemical method for evaluation of structural perfection of hydrogen-terminated Si(111) surface, JPN J A P 2, 39(12A), 2000, pp. L1206-L1208
In this study, we measured the electrochemical oxidation currents on n-Si(1
11) surfaces at a potential near the flat-band potential. The current becam
e small when the surface was treated with oxygen-free water, which is effec
tive for Battening the Si(111) surface, before the electrochemical measurem
ent. This current was attributed to the oxidation of Si atoms on step and k
ink sites, and was concluded to be a good measure of the structural perfect
ion of Si(111) surfaces.