Anodic electrodeposition of copper oxide/hydroxide films by alkaline solutions containing cuprous cyanide ions

Citation
Ig. Casella et M. Gatta, Anodic electrodeposition of copper oxide/hydroxide films by alkaline solutions containing cuprous cyanide ions, J ELEC CHEM, 494(1), 2000, pp. 12-20
Citations number
40
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences
Journal title
JOURNAL OF ELECTROANALYTICAL CHEMISTRY
ISSN journal
15726657 → ACNP
Volume
494
Issue
1
Year of publication
2000
Pages
12 - 20
Database
ISI
SICI code
Abstract
A novel procedure of anodic electrodeposition of copper oxides and hydroxid es on glassy carbon and noble metals electrodes in an alkaline medium is de scribed. The deposited films have been investigated by electrochemical and by X-ray photoelectron spectroscopy (\XPS) techniques. The copper films are deposited on the electrode surface as Cu(OH)(2) and CuO after the dissocia tion of the Cu(CN)(n)(1-n) complex caused probably by the formation of Cu-I II species at relatively high applied potentials (i.e. 0.5 V). The resultin g active copper films, independently of the electrochemical procedure adopt ed (i.e. potentiostatic or potentiodynamic conditions), appear to be unifor m, smooth and with a good degree of adhesion on the electrode surface The e lectrocatalytic properties of the copper deposited films were investigated in an alkaline medium for the electrooxidation of several classes of organi c compounds. (C) 2000 Elsevier Science B.V. All rights reserved.