A comparison of defects in helium implanted alpha- and beta-SiC

Citation
P. Jung et al., A comparison of defects in helium implanted alpha- and beta-SiC, J NUCL MAT, 283, 2000, pp. 806-810
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Nuclear Emgineering
Journal title
JOURNAL OF NUCLEAR MATERIALS
ISSN journal
00223115 → ACNP
Volume
283
Year of publication
2000
Part
B
Pages
806 - 810
Database
ISI
SICI code
0022-3115(200012)283:<806:ACODIH>2.0.ZU;2-Z
Abstract
Specimens of alpha- and beta -SiC were implanted homogeneously at room temp erature with helium to about 30% of their thickness to concentrations up to 2450 atppm. Lattice straining was determined from the bending radius of th e specimens by surface profilometry after implantation and during subsequen t annealing. Evolution and annealing of straining in alpha- and beta -SiC w ere remarkably similar. Above 1300 degreesC specimen volume increased, whic h, according to transmission electron microscopy, was ascribed to the growt h of helium clusters. Microstructural investigations showed bubbles along g rain boundaries and disk-shaped clusters of bubbles in the grain interior o n (0 0 0 1) habit planes in hexagonal alpha -SiC and on (Ill)in cubic beta -SIC. (C) 2000 Elsevier Science B.V. All rights reserved.