Collision-free infrared multiphoton dissociation of silane

Citation
J. Makowe et al., Collision-free infrared multiphoton dissociation of silane, J PHYS CH A, 104(49), 2000, pp. 11505-11511
Citations number
37
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF PHYSICAL CHEMISTRY A
ISSN journal
10895639 → ACNP
Volume
104
Issue
49
Year of publication
2000
Pages
11505 - 11511
Database
ISI
SICI code
1089-5639(200012)104:49<11505:CIMDOS>2.0.ZU;2-R
Abstract
We have measured an upper limit of 17 J/cm(2) for the threshold fluence for collision-fret CO2 laser IRMPD of silane by detecting the SiH2 product in its electronic and vibrational ground state. The threshold drops to similar to4 J/cm(2) when silane molecules are irradiated by all lines from a pulse d NH3 laser. This value further drops to less than 2 J/cm(2) when the molec ules are pre-excited to the first Si-H stretch overtone. Using the NH3 lase r on the 868 cm(-1) line, the dissociation yield of pre-excited SiH4 reache s saturation at a laser fluence of 6 J/cm(2). The substantial difference in the fluence threshold and optimal dissociation frequency of the ground and excited molecules allows us to perform highly selective dissociation of pr e-excited silane in the presence of a large excess of ground-state molecule s.