The electron swarm growth processes in SF6-Xe gas mixtures have been studie
d by a pulsed Townsend method over the range 32.24 less than or equal to E/
N less than or equal to 564.2 Td (1 Td = 10(-21) Vm(2)), where E is the ele
ctric field and N is the gas density of the mixture. The variation patterns
as a function of the density-reduced electric field of the effective ioniz
ation coefficient <(<alpha>)over bar>, electron drift velocity Ve and longi
tudinal diffusion coefficient D-L in SF6-Xe gas mixtures have been given. T
he dielectric strength of SF6-Xe gas mixtures has also been determined, whi
ch varies linearly with SF6 concentration in the gas mixtures.