Analysis of multi layer system with X-ray fluorescence

Citation
A. Wittkopp et al., Analysis of multi layer system with X-ray fluorescence, METALL, 54(11), 2000, pp. 662-666
Categorie Soggetti
Metallurgy
Journal title
METALL
ISSN journal
00260746 → ACNP
Volume
54
Issue
11
Year of publication
2000
Pages
662 - 666
Database
ISI
SICI code
0026-0746(2000)54:11<662:AOMLSW>2.0.ZU;2-#
Abstract
Analysis of multi layer system can be performed non-destructive and contact -less with X-Ray Fluorescence. Especially semiconductor industry and micro sensorics need measuring systems that call analyse the more and more comple x systems. This measuring system has to determine not only coating thicknes s but also the composition of the several layers. In this paper the princip les of X-Ray fluorescence for coating thickness testing are referred and th e analytical performance of this method is documented for several purposes (Micro sensors, Solar cells).