A refined technology of SiC p-n junctions is proposed. Usage of boron to co
mpensate the high doping of n layers on structures with different continuou
s areas is primarily experimentally demonstrated. A comparison between the
electrical characteristics of boron compensated and uncompensated diodes is
presented. Then a technology using cellular structure for 6H-SiC large are
a p-n devices is designed and optimized. For these split area structures th
e micropipes effect is avoided. Based on a matrix structure with 0.16 mm(2)
cell area a medium power (600 V breakdown voltage and 1 A at forward volta
ge of 5 V) p-n diode has been fabricated and tested. (C) 2000 Elsevier Scie
nce Ltd. All rights reserved.