In a small scale MOCVD system YBCO films with j(c)(77 K) > 1 MA were deposi
ted onto substrates, which were continuously moved through the deposition c
hamber. Two routes for the buffer layer deposition onto textured Ni tapes w
ere chosen: a) CeO2, LaMnO3 and LaCrO3 films were deposited in hydrogen atm
osphere by MOCVD. On LaAlO3 and R-Al2O3 crystals epitaxial films were obtai
ned b) textured NiO layers were grown by oxidation of textured Ni tapes. Ba
sed on the small scale system an enlarged MOCVD reactor was constructed.