Tailoring of epitaxial strain in doped lanthanummanganite thin films

Citation
Hu. Habermeier et al., Tailoring of epitaxial strain in doped lanthanummanganite thin films, PHYSICA C, 341, 2000, pp. 777-778
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICA C
ISSN journal
09214534 → ACNP
Volume
341
Year of publication
2000
Part
2
Pages
777 - 778
Database
ISI
SICI code
0921-4534(200011)341:<777:TOESID>2.0.ZU;2-L
Abstract
We have grown single crystalline doped LaMnO3 thin films using the pulsed l aser deposition technique and analyzed the interrelation of epitaxial strai n with transport properties. An unexpected possibility of tailoring the met al-insulator transition temperature, T-MI, has been developed and correlate d with biaxially epitaxial strain. Whereas in the case of La2/3Ca1/3MnO3 a reduction of T-MI is observed, we demonstrate an unexpected epitaxial strai n-induced metal-insulator transition for La.88Sr.1MnO3 thin films. The resu lts are explained by biaxial tensile and compressive stress of the films, r espectively.