Iridium-related deep levels in n-type silicon

Citation
J. Bollmann et al., Iridium-related deep levels in n-type silicon, PHYS ST S-B, 222(1), 2000, pp. 251-260
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICA STATUS SOLIDI B-BASIC RESEARCH
ISSN journal
03701972 → ACNP
Volume
222
Issue
1
Year of publication
2000
Pages
251 - 260
Database
ISI
SICI code
0370-1972(200011)222:1<251:IDLINS>2.0.ZU;2-K
Abstract
Iridium-related deep levels in n-type silicon were studied by Deep Level Tr ansient Spectroscopy (DLTS). Two different sets of samples were used which differ in the Ir-doping process. Stable Ir isotopes were introduced in the melt during the Boating-zone growth process. Other samples were implanted w ith radioactive mercury isotopes, which decay via gold and platinum to irid ium or osmium. In these samples an identification of Ir-related levels from the known half-life of the isotopes is possible. Two dominant levels at E- c - 0.28 eV and E-c - 0.57 eV are assigned to isolated substitutional Ir. T wo other levels at E-c - 0.17 eV and E-c - 0.45 eV are identified as iridiu m-hydrogen complexes containing one or two hydrogen atoms, respectively.