Threshold energy for the photon-stimulated desorption of Rb atoms from polydimethylsiloxane films

Citation
Ra. Bernheim et al., Threshold energy for the photon-stimulated desorption of Rb atoms from polydimethylsiloxane films, CHEM P LETT, 332(1-2), 2000, pp. 1-4
Citations number
14
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
CHEMICAL PHYSICS LETTERS
ISSN journal
00092614 → ACNP
Volume
332
Issue
1-2
Year of publication
2000
Pages
1 - 4
Database
ISI
SICI code
0009-2614(200012)332:1-2<1:TEFTPD>2.0.ZU;2-L
Abstract
The laser frequency dependence of the photon-stimulated desorption (PSD) of Rb atoms from surfaces prepared by adsorption of rubidium vapor on thin fi lms of polydimethylsiloxane (PDMS) was determined at low light intensities and at room temperature to have a threshold energy of 11 100 cm(-1). The de sorption of Rb follows the same functional dependence on laser frequency an d intensity as that found for Na and Na-2, where thresholds of 9500 and 11 500 cm(-1) were determined, respectively, and where a charge transfer model for the adsorbed species could successfully explain the 2000 cm(-1) differ ence in energy thresholds. (C) 2000 Elsevier Science B.V. All rights reserv ed.