Citation
Hm. Yates et al., Growth of tin oxide in opal, CHEM VAPOR, 6(6), 2000, pp. 283
Citations number
7
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
CHEMICAL VAPOR DEPOSITION
ISSN journal
09481907
→ ACNP
Volume
6
Issue
6
Year of publication
2000
Database
ISI
SICI code
0948-1907(200011)6:6<283:GOTOIO>2.0.ZU;2-T
Abstract
There is interest in enhancing photonic bandgap materials such as opal. Dop
ing with tin oxide could add electrical contacting throughout the infilled
opal rather than just the outer surface. Here tin oxide is chemical vapor d
eposited by alternate introduction of the: precursors. The polycrystalline
deposit (see Figure) was found to coat the opal spheres to a thickness of a
bout 18 nm.