Pure tantalum specimens were irradiated with 2.4 MeV Cu2+ ions up to 3 dpa
at temperatures between room temperature and 1073 K. Transmission electron
microscope (TEM) observation and micro-indentation tests were carried out t
o correlate the microstructure and the hardness. Significant radiation hard
ening occurred at temperature ranging from 673 to 873 K. Isochronal anneali
ng of a specimen irradiated at room temperature up to a dose of 0.3 dpa res
ulted in a rapid increase in hardening between 573 and 673 K and continued
to increase up to 873 K. The microstructure showed that the formation of sm
all defect clusters is the major reason for both the radiation hardening an
d the radiation-anneal hardening. (C) 2000 Elsevier Science B.V. All rights
reserved.