We proposed and investigated the characteristics of a lateral field emissio
n array (LFEA) structure with polycrystalline silicon emitters using the LO
GOS (local oxidation of polysilicon) process for display applications. We f
abricated an LFEA device which had a 600x600 mum(2) pixel with 28 cathode t
ips and 56 gate tips. It showed a very low turn-on voltage of about 8 V and
a quite high emission current of 424 muA/pixel at a substrate-to-cathode v
oltage of 40 V and V-GC=0 V. Ii phosphor arrayed anode ITO glass is aligned
with the LFEA, which is selectively etched through for an electron path, t
he LEFA will be highly applicable as a field emission display with many adv
antages, such as simple process, easy distance control between the anode an
d the cathode, and low process cost.