Zone-plate-array lithography using synchrotron radiation

We present our results in the design and development of a multiple-beam x-r ay pattern generator based on an array of Fresnel zone plates (FZPs). Expos ures have been carried out using a synchrotron source at SuperACO (France), a PC-controlled piezoelectric scanning stage; and an array of FZPs fabrica ted by high resolution electron-beam lithography and reactive-ion etching o f a tungsten absorber. In particular, we have implemented an array of apert ures using a self-aligned process in order to minimize background intensity coming from diffraction orders other than the positive fil st order. We sh ow that even with polychromatic synchrotron radiation and relatively low re solution FZPs, patterns of various geometries could be successfully written in poly(methylmethyacrylate) resist and submicrometer resolution was obtai ned after metal liftoff. (C) 2000 American Vacuum Society. [S0734-211X(00)1 1506-9].