Correction of the field curvature in SCALPEL projection systems

Authors
Citation
K. Xiu et Jm. Gibson, Correction of the field curvature in SCALPEL projection systems, J VAC SCI B, 18(6), 2000, pp. 3067-3071
Citations number
7
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
18
Issue
6
Year of publication
2000
Pages
3067 - 3071
Database
ISI
SICI code
1071-1023(200011/12)18:6<3067:COTFCI>2.0.ZU;2-P
Abstract
The field curvature and axial chromatic aberration, 2 of 13 aberrations in an electron optical system, make the major contributions to the image blur of a SCALPEL projector. We first give a simple yet quantitative evaluation of the point spread function from the field curvature and chromatic aberrat ion and show the merit of keeping a comparatively low field curvature. Then we describe two ways to reduce the field curvature in an electron projecti on system. One is to use an immersion magnetic doublet with a constant fiel d along most of the optical column with opposite signs at two ends which ar e connected by a sharp field transition region. The other way is to use spa ce charge foils. By putting a space charge foil with homogeneously distribu ted space charge density on either the object or image plane, we show the f ield curvature can be eliminated in principle without affecting any other a berrations. (C) 2000 American Vacuum Society. [S0734-211X(00)12506-5].