Demagnifying immersion magnetic lenses used for projection electron beam lithography without crossovers

Authors
Citation
M. Cheng et Tt. Tang, Demagnifying immersion magnetic lenses used for projection electron beam lithography without crossovers, J VAC SCI B, 18(6), 2000, pp. 3132-3137
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
18
Issue
6
Year of publication
2000
Pages
3132 - 3137
Database
ISI
SICI code
1071-1023(200011/12)18:6<3132:DIMLUF>2.0.ZU;2-Z
Abstract
Curvilinear-axis electron optical focusing and aberration theory of wide el ectron beams in immersion magnetic lenses, which can be used for projection electron beam lithography, are put forward, and second-order aberration fo rmulas have been derived using the symbolic manipulation software MATHEMATI CA(R). A program was written to calculate numerically the wide beam Gaussia n focusing and aberration properties of these lenses by using the curviline ar-axis theory. The magnetic structures that have convergent force lines ha ve been studied. As an example, lenses with an analytical axial magnetic fi eld distribution are calculated. The results show that wide beam projection images without crossovers can be formed with demagnified lateral magnifica tion, and with a submicron and nanometer lateral resolution over a larger f ield size. (C) 2000 American Vacuum Society. [S0734-211X(00)07006-2].