Focused electron beam induced deposition of gold

Citation
I. Utke et al., Focused electron beam induced deposition of gold, J VAC SCI B, 18(6), 2000, pp. 3168-3171
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
18
Issue
6
Year of publication
2000
Pages
3168 - 3171
Database
ISI
SICI code
1071-1023(200011/12)18:6<3168:FEBIDO>2.0.ZU;2-3
Abstract
Codeposition of hydrocarbons is a severe problem during focused electron be am writing of purr: metal nanostructures. When using organometallic precurs ors, a low metal content carbonaceous matrix embedding and separating numer ous nanosized metal clusters is formed. Tn this work, we present a new and easy approach to obtain high purity gold lines: the use of inorganic PF3AuC l as a precursor. Electrical resistivities as low as 22 mu Omega cm at 295 K (ten times the bulk Au value) were obtained. This is to our knowledge the best value for focused electron beam deposition obtained from the vapor ph ase so far. No special care was taken to prevent hydrocarbon contamination. The deposited nanostructure consists of gold grains varying in size and pe rcolation with beam parameters. (C) 2000 American Vacuum Society. [S0734-21 1X(00)06906-7].