Three-dimensional nanostructure fabrication by focused-ion-beam chemical vapor deposition

Citation
S. Matsui et al., Three-dimensional nanostructure fabrication by focused-ion-beam chemical vapor deposition, J VAC SCI B, 18(6), 2000, pp. 3181-3184
Citations number
6
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
18
Issue
6
Year of publication
2000
Pages
3181 - 3184
Database
ISI
SICI code
1071-1023(200011/12)18:6<3181:TNFBFC>2.0.ZU;2-E
Abstract
Three-dimensional nanostructure fabrication has been demonstrated by 30 keV Ga+ focused ion beam assisted deposition using a aromatic hydrocarbon prec ursor. The characterization of deposited film on a silicon substrate was pe t-formed by a transmission microscope and Raman spectra. This result indica tes that the deposition film is a diamondlike amorphous carbon. Production of three-dimensional nanostructure is discussed. Microcoil, drill, and bell ows with 0.1 mum dimension were fabricated as parts of the microsystem. Fur thermore, microstructure plastic arts is advocated as a new field using mic robeam technology, presenting one example of a microwine glass with 2.75 mu m external diameter and 12 mum height. (C) 2000 American Vacuum Society. [S 0734-211X(00)06806-2].