Surface and line-edge roughness in solution and plasma developed negative tone resists: Experiment and simulation

Authors
Patsis, GP Tserepi, A Raptis, I Glezos, N Gogolides, E Valamontes, ES
Citation
Gp. Patsis et al., Surface and line-edge roughness in solution and plasma developed negative tone resists: Experiment and simulation, J VAC SCI B, 18(6), 2000, pp. 3292-3296
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
18
Issue
6
Year of publication
2000
Pages
3292 - 3296
Database
ISI
SICI code
1071-1023(200011/12)18:6<3292:SALRIS>2.0.ZU;2-I
Abstract
A methodology is described for the experimental and theoretical study of su rface roughness (SR) and line-edge roughness (LER) and their relation for s olution and plasma developed resist schemes. Experimental results for a neg ative-tone nonchemically amplified siloxane bilayer resist scheme are shown . In addition, a molecular-type simulation of SR and LER is presented. The simulator can follow the appearance of SR and LER after each process step a nd predict the roughness dependence on material properties and process cond itions. The simulation results are compared with SR experimental data for a negative-tone chemically amplified epoxy resist. (C) 2000 American Vacuum Society. [S0734-211X(00)12406-0].